Table of Contents
PPT Slide
Introduction
Reaction Probabilities and Rates
Selectivity
A Vapor-phase Gentle Etchant
CMOS Micro-structures released with XeF2
Using XeF2 as an Etchant
A Simple XeF2 Etching System
A XeF2 Etching System with Expansion Chamber
XeF2 Etching System in Idle Mode
Pulse Etching Cycle -- Evacuation
Pulse Etching Cycle -- Gas expansion
Pulse Etching Cycle -- Etching
Pulse Etching Cycle -- Purging
Pulse Etching Cycle -- Evacuation
Pressure Changes in a Pulse Etching Cycle
Photo of the UCLA Etching System
Etching Experiments
Mask Pattern for Etching Experiments
SEMs of Etch Pits from Square Patterns
SEMs of Square Etch Pit Arrays
Bulk Silicon Etch Pit Profile
Bulk Silicon Etching with Variable Time Pulses
Bulk Silicon Etching with Increasing Pulses
Bulk Silicon Etching of Multiple Samples
Total Volume Etched for Multiple Samples
Total Volume Etched Under Different Conditions
Etch Pit Roughness
Surface Roughness for a 200mm Square Opening
Proximity Effect
Etch Result Variations
Polysilicon Film Etching (variable-time pulse)
Polysilicon Film Etching (1 -12 pulses)
XeF2 Pulse Etching Summary
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