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BPN410: Endeavor AT Aluminum Nitride Deposition Process Characterization

Project ID BPN410
Website
Start Date Mon 2007-Aug-13 21:57:13
Last Updated Thu 2010-Aug-12 15:35:47
Abstract A new cluster tool system, the Endeavor AT, was recently installed and characterized in the Marvell Nanolab. The system was donated by Analog Devices, and consists of three physical vapor deposition chambers for molybdenum sputtering, piezoelectric aluminum nitride sputtering, and aluminum sputtering respectively. The AlN process was thoroughly characterized with response surface design and factorial design of experiments. The AlN process has been released for general labmember use. The results of the process characterization are presented here.
Status New
Funding Source Industry
IAB Research Area Package, Process & Microassembly
Researcher(s) Matthew Wasilik
Advisor(s) John M. Huggins
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