User: Guest |  Site Map |  My BSAC Profile

BPN463: Controlled Nanoscale Doping of Semiconductors via Molecular Monolayers

Project ID BPN463
Start Date Sat 2008-Jul-26 17:27:40
Last Updated Mon 2009-Feb-02 16:38:30
Abstract One of the major challenges towards scaling down of the electronic devices to the nm-regime is attaining controlled doping of semiconductor materials with atomic accuracy. At such small scales, the various existing technologies suffer from a number of setbacks, including an inability to achieve junction abruptness down to nm range, stochastic distribution of the dopant atoms, crystal damage, and incompatibility with nanomaterials. In this work, We report the formation of sub-5 nm ultrashallow junctions in 4” Si wafers enabled by the molecular monolayer doping of phosphorous and boron atoms and the use of conventional spike annealing. The junctions are characterized by secondary ion mass spectrometry and non-contact sheet resistance measurements. It is found that the majority (~70%) of the incorporated dopants are electrically active, therefore, enabling a low sheet resistance for a given dopant areal dose. The wafer-scale uniformity is investigated and found to be limited by the temperature homogeneity of the spike anneal tool used in the experiments. Notably, minimal junction leakage currents (<1 uA/cm2) are observed which highlights the quality of the junctions formed by this process. The results clearly demonstrate the versatility and potency of the monolayer doping approach for enabling controlled, molecular-scale ultrashallow junction formation without introducing defects in the semiconductor.
Status Continuing
Funding Source Industry
IAB Research Area NanoTechnology: Materials, Processes & Devices
Researcher(s) Johnny C. Ho
Advisor(s) Ali Javey
Detailed Information
Secure Access

Private Abstract
Research Report
Summary Slide PDF | VIDEO
Active Feedback (or Request for Response)


  • Copyright Notification: All papers downloaded from this site are © University of California or the publisher, all rights reserved. Contact the BSAC Webmaster for permission related to copyrighted materials.
  • Links on these pages to commercial sites do not represent endorsements by UC or its affiliates.
  • Privacy Policy
  • Contact Us
  User logged in as: Guest
  User Idle since: June 22, 2018, 5:59 pm