| Project ID |
BPN501 |
| Website |
|
| Start Date |
Thu 2009-Jan-29 13:14:50 |
| Last Updated |
Mon 2009-Aug-24 16:33:54 |
| Abstract |
Large-area, patterned printing of nanowires by using fluorinated self-assembled monolayers (SAM) as the resist layer is demonstrated. By projecting a light pattern on the surface of the monolayer-resist in an oxygen rich environment, sticky and non-sticky regions on the surface are directly defined in a single-step process which then enables the highly specific and patterned transfer of the nanowires by the contact printing process, without the need for a subsequent lift-off step. This work demonstrates a simple route toward scalable, patterned printing of nanowires on substrates by utilizing light-tunable, nanoscale chemical interactions, and demonstrates the versatility of molecular monolayers for use as a resist layer. |
| Status |
Completed |
| Funding Source |
Other |
| IAB Research Area |
NanoTechnology: Materials, Processes & Devices |
| Researcher(s) |
Toshitake Takahashi, Kuniharu Takei, Johnny C. Ho, Zhiyong Fan |
| Advisor(s) |
Ali Javey |
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