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BPN501: Patterned Contact Printing with Monolayer for Aligned Nanowire Arrays

Project ID BPN501
Website
Start Date Thu 2009-Jan-29 13:14:50
Last Updated Sat 2010-Jan-23 15:04:20
Abstract Large-area, patterned printing of nanowires by using fluorinated self-assembled monolayers (SAM) as the resist layer is demonstrated. By projecting a light pattern on the surface of the monolayer-resist in an oxygen rich environment, sticky and non-sticky regions on the surface are directly defined in a single-step process which then enables the highly specific and patterned transfer of the nanowires by the contact printing process, without the need for a subsequent lift-off step. This work demonstrates a simple route toward scalable, patterned printing of nanowires on substrates by utilizing light-tunable, nanoscale chemical interactions, and demonstrates the versatility of molecular monolayers for use as a resist layer.
Status Completed
Funding Source
IAB Research Area NanoTechnology: Materials, Processes & Devices
Researcher(s) Toshitake Takahashi, Kuniharu Takei, Johnny C. Ho, Zhiyong Fan
Advisor(s) Ali Javey
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