BERKELEY SENSOR & ACTUATOR CENTER
UC BERKELEY UC DAVIS
User: Guest |  Site Map |  My BSAC Profile
HOME  PROJECTS  THRUSTS  PUBLICATIONS  ABOUT BSAC  DIRECTORY  ALUMNI  FOR BSAC RESEARCHERS  EVENTS CALENDAR  SECURE LOGIN
Affiliate Faculty
     
 Lee
 Lin
 Wu
 

BSAC5: VUV Lamp Assembly for Wafer Scale Surface Modification

Project ID BSAC5
Website
Start Date Thu 2005-Jan-20 09:14:06
Last Updated Tue 2007-Aug-14 20:21:36
Abstract Liftoff is a processing technique often preferred for patterning metal thin films. In a liftoff process, the resist is patterned first, and then the metal film is deposited. After metal deposition, the resist is dissolved and – if the process has been optimized to insure poor metal step coverage - the unwanted metal is removed (“lifted off”) from the regions where the remaining resist is dissolved. Liftoff is preferable for difficult to etch metals, in cases where the metal etch has a poor selectivity relative to underlying layers and in situations that require minimizing plasma or acid exposure of underlying layers. Liftoff can also enable fine feature metal patterning with limited process tools since the minimum feature size is dependent primarily upon the resist process rather than upon the performance of the resist and a metal etch system. The goal of this work was to define a baseline liftoff process for use by a large group of researchers with a broad range of metals and a constantly changing set of deposition conditions. Therefore, this work attempted to identify a generally preferred resist system without testing with a specific metal deposition process; whereas, optimization of a specific liftoff process would include detailed characterization of the resist and the metal deposition. Several methods of liftoff were examined and results will be reported.
Status Continuing
Funding Source Industry
IAB Research Area Package, Process & Microassembly
Researcher(s) Matthew Wasilik
Advisor(s) John M. Huggins
Detailed Information
Secure Access

Private Abstract
Research Report
Poster
Summary Slide
Active Feedback (or Request for Response)

 

  • Copyright Notification: All papers downloaded from this site are © University of California or the publisher, all rights reserved. Contact the BSAC Webmaster for permission related to copyrighted materials.
  • Links on these pages to commercial sites do not represent endorsements by UC or its affiliates.
  • Privacy Policy
  • Contact Us

   webmaster@bsac.eecs.berkeley.edu
  User logged in as: Guest
  User Idle since: April 18, 2014, 4:20 pm