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RTH35: Novel SiGe Processes for Electrostatically Actuated MEMS Resonators

Project ID RTH35
Website
Start Date NO START DATE RECORDED
Last Updated Wed 2006-Aug-23 14:40:05
Abstract As an alternative material for surface micromachining, polycrystalline silicon-germanium (poly-SiGe) has comparable processes and material properties to polycrystalline silicon (poly-Si). Its low processing temperature is the major advantage of poly-SiGe as it enables post-CMOS integration of MEMS. This modular approach to MEMS integration is an attractive route to higher performance and lower cost microsystems.
Status Completed
Funding Source Industry
IAB Research Area Package, Process & Microassembly
Researcher(s) Carrie Low
Advisor(s) Roger T. Howe, Tsu-Jae King
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