| Project ID |
RTH35 |
| Website |
|
| Start Date |
NO START DATE RECORDED |
| Last Updated |
Wed 2006-Aug-23 14:40:05 |
| Abstract |
As an alternative material for surface micromachining, polycrystalline silicon-germanium (poly-SiGe) has comparable processes and material properties to polycrystalline silicon (poly-Si). Its low processing temperature is the major advantage of poly-SiGe as it enables post-CMOS integration of MEMS. This modular approach to MEMS integration is an attractive route to higher performance and lower cost microsystems. |
| Status |
Completed |
| Funding Source |
Industry |
| IAB Research Area |
Package, Process & Microassembly |
| Researcher(s) |
Carrie Low |
| Advisor(s) |
Roger T. Howe, Tsu-Jae King |
|
|
